Academic Comparison between FIT and Beis Medrash Heichal Dovid

Fashion Institute of Technology and Beis Medrash Heichal Dovid are frequently compared when students or parents prepare college admissions. FIT is a four-year, public school located in New York, NY and Beis Medrash Heichal Dovid is a four-year, private (not-for-profit) school located in Far Rockaway, NY.

The following list compares two colleges briefly in important perspectives. You can compare them with comprehensive information on full comparison page.

Comparison Table with important Academic Factors

Fashion Institute of Technologyvs.Beis Medrash Heichal Dovid
New York, New YorkLocationFar Rockaway, New York
Four-year, PublicSchool Typefour-year, Private (not-for-profit)
Master's degreeHighest Degree OfferedBachelor's degree
Master's College and University (smaller programs)Carnegie ClassificationTheological seminaries, Bible college, and other faith-related institution
In-State$8,174
Out-Of-State$22,696
2025 Tuition & Fees$10,480
46%% Receiving Financial Aid43%
$7,766Average Amount of Financial Aid$7,882
60.24 %Acceptance Rates78.95 %
55.81 %Yield (Enrollment Rates)100.00 %
-SAT Score-
-ACT Score-
81 %Graduation Rate53 %
8 %Transfer-out Rate47 %
91 %Retention Rate84 %
8,206Student Population206
205Number of Faculties6
16 to 1Students to Faculty Ratio23 to 1
Distance Learning (Online Classes), Study Abroad, Weekend/Evening CollegeSpecial Learning Opportunities-
Academic/career counseling service, Employment services, Placement servicesOn Campus Student ServicesAcademic/career counseling service