Academic Comparison between Beis Medrash Heichal Dovid and FIT

Beis Medrash Heichal Dovid and Fashion Institute of Technology are frequently compared when students or parents prepare college admissions. Beis Medrash Heichal Dovid is a four-year, private (not-for-profit) school located in Far Rockaway, NY and FIT is a four-year, public school located in New York, NY.

The following list compares two colleges briefly in important perspectives. You can compare them with comprehensive information on full comparison page.

Comparison Table with important Academic Factors

Beis Medrash Heichal Dovidvs.Fashion Institute of Technology
Far Rockaway, New YorkLocationNew York, New York
Four-year, Private (not-for-profit)School Typefour-year, Public
Bachelor's degreeHighest Degree OfferedMaster's degree
Theological seminaries, Bible college, and other faith-related institutionCarnegie ClassificationMaster's College and University (smaller programs)
$10,4802025 Tuition & Fees
In-State$8,174
Out-Of-State$22,696
43%% Receiving Financial Aid46%
$7,882Average Amount of Financial Aid$7,766
78.95 %Acceptance Rates60.24 %
100.00 %Yield (Enrollment Rates)55.81 %
-SAT Score-
-ACT Score-
53 %Graduation Rate81 %
47 %Transfer-out Rate8 %
84 %Retention Rate91 %
206Student Population8,206
6Number of Faculties205
23 to 1Students to Faculty Ratio16 to 1
-Special Learning OpportunitiesDistance Learning (Online Classes), Study Abroad, Weekend/Evening College
Academic/career counseling serviceOn Campus Student ServicesAcademic/career counseling service, Employment services, Placement services